Webwww.trymax-semiconductor.com NEO 2000 The NEO 2000 product line is an advanced plasma ashing/ etch system from Trymax Semiconductor Equipment with the latest … WebOct 17, 2024 · The NEO 2000 Series is a reliable high throughput and low cost of ownership dual chamber system. It will be configured with both high and low temperature plasma chambers and process wafers from 4 up to 8’’. These multi-system orders come in addition of previous multi-system orders received by Trymax from the same customer a few years …

NEO 2000UV - www.trymax-semiconductor.com - YouTube

WebThe NEO 2000UV is specifically designed for applications up to 200mm diameter substrates. Contact us now Trymax Semiconductor Equipment B.V. Roggeweg 26B 6534 AJ … WebIt is ready for high volume of production and can be configured with any of the current available Trymax NEO process modules, from 100 to 300mm wafer sizes. Small footprint … first oswald the lucky rabbit cartoon

Trymax receives multi-system orders from a Top 10 …

WebOct 17, 2024 · Trymax’s NEO 2000 Series was selected by the customer to perform photoresist ashing and descum on SiC and LiTaO3 substrates. Main end applications will be in the field of RF and power ... WebCAE finds the best deals on used TRYMAX NEO 2000. We’re accountable for every transaction — CAE will seek to collect as much information as you require to ensure that … WebTrymax’s NEO products for ashing, etching and descum are applicable for 150mm, 200mm and 300mm substrates. The firm’s bridge tools are fully flexible for processing multiple different substrates types, such as silicon, gallium arsenide (GaAs), silicon carbide (SiC), LiN, LiT, eWLB (embedded wafer-level ball-grid array) and Taiko wafers, from R&D to high … firstouch led