WebSep 26, 2024 · The NEO 200A product is the smallest footprint single chamber platform for advanced ashing and etching products from Trymax Semiconductor Equipment. It’s a f... WebTrymax. Trymax has developed a range of different process modules for use on its various NEO platforms: high temperature microwave downstream module, RF based etching …
Trymax NEO 3000 series - Trymax Semiconductor
WebSep 9, 2024 · Check out the Plasma-Therm blog to read technical articles on plasma processing and other technologies (e.g. etch, deposition, PVD, Rapid Thermal Processing, ICP, RIE, PECVD, deep silicon etch, Ion Beam Deposition, Plasma Dicing, HDPCVD), semiconductor manufacturing. Also, you can find out about the latest company news, … WebOct 18, 2024 · Trymax’s NEO 2000 Series was selected by the customer to perform photoresist ashing and descum on SiC and LiTaO 3 substrates. Main end applications will be in the field of RF and power electronics that are both facing significant growth driven by the IoT, 5G, and automotive. pony birthday invitations
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WebAug 21, 2024 · The NEO 200A series from Trymax with microwave downstream plasma technology was selected to perform resist stripping, descum and surface cleaning on indium phosphide (InP) wafers. This order illustrates the competitiveness of the single chamber and fully automated solution of Trymax for the photonics market. WebNEO 2000 series is a dual chamber system for wafers up to 200mm. NEO 3000 series is a dual chamber system for wafers up to 300mm. All systems will be configured with Trymax’s dual source plasma technology combining RF and microwave to provide the best ashing rate and uniformity trade-off. WebSep 26, 2024 · The NEO 2400 series production platform is one of the latest additions to the industry leading NEO range of advanced plasma ashing and etching products from ... pony blues lyrics